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アパタイト構造体、及びアパタイトパターン形成方法
专利权人:
八尾;健
发明人:
八尾 健
申请号:
JP2000104926
公开号:
JP4955849B2
申请日:
2000.04.06
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide apatite fine structure having homogeneity of high precision and desired shape and to provide a method for easily forming a desired apatite pattern. SOLUTION: The fine structure containing a part where an apatite layer is stacked on a base material and a part where the apatite layer is not stacked on the base material and/or their combination is provided. Further a method for forming the apatite layer having the desired pattern or structure on a base material surface contains (a) a process in which a region where the apatite layer is not to be formed is covered with a covering material on at least one surface of the base material (b) a process in which the apatite layer is formed (c) a process in which the covering material is removed.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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