Amide compound and salt thereof, biofilm formation inhibitor using the same, biofilm remover and disinfectant

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专利权人:

国立大学法人;大塚化学株式会社;東京大学;国立大学法人 東京大学

发明人:

菅 裕明,五十嵐 潤

申请号：

JP2008541032

公开号：

JP5247459B2

申请日:

2007.10.26

申请国别(地区):

JP

年份:

2013

代理人:

摘要：

The present invention provides a new amide compound and salt thereof that is capable of inhibiting biofilm formation or removing deposited biofilm. The present invention also provides a biofilm formation inhibitor or a biofilm remover containing the amide compound or salt thereof as an active ingredient. An amide compound or salt thereof according to the present invention is denoted by General Formula (1): wherein R 1 is a hydrogen atom or a hydroxyl group, R 2 is a C 5-12 alkyl group, and Q is a substituent denoted by Formula (Q1) or (Q2), wherein n and m are 0 or 1.

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