"Low molecular weight of polysulfated derivatives of hyaluronic acid and drugs containing hyaluronic acid."

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专利权人:

Otsuka Chemical CO., LTD;OTSUKA PHARMACEUTICAL CO, LTD.

发明人:

Atsushi Azuma,Fumitaka Goto,Hiroaki Asai,Junji Takaba,Kazuaki Kakehi,Kazunari Izumi,Masaru Nishida,Minoru Kashimoto,Naohiro Hayashi,Satoru Nakazato,Satoshi Shimizu,Takahiro Tomoyasu,Takao Taki,Takashi

申请号：

BRPI1007325

公开号：

BRPI1007325A2

申请日:

2010.02.01

申请国别(地区):

BR

年份:

2019

代理人:

摘要：

A low-molecular-weight polysulfated hyaluronic acid derivative useful for prevention and/or treatment of an allergic disease. An agent for prevention and/or treatment of an allergic disease selected from pollinosis, allergic rhinitis, allergic conjunctivitis, atopic dermatitis, and asthma, represented by the following general formula (IA) or (IB)； wherein n represents a number of 0 to 15； R's each independently represent a hydrogen atom or an SO 3 H group etc.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/