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"Low molecular weight of polysulfated derivatives of hyaluronic acid and drugs containing hyaluronic acid."
专利权人:
Otsuka Chemical CO., LTD;OTSUKA PHARMACEUTICAL CO, LTD.
发明人:
Atsushi Azuma,Fumitaka Goto,Hiroaki Asai,Junji Takaba,Kazuaki Kakehi,Kazunari Izumi,Masaru Nishida,Minoru Kashimoto,Naohiro Hayashi,Satoru Nakazato,Satoshi Shimizu,Takahiro Tomoyasu,Takao Taki,Takashi
申请号:
BRPI1007325
公开号:
BRPI1007325A2
申请日:
2010.02.01
申请国别(地区):
BR
年份:
2019
代理人:
摘要:
A low-molecular-weight polysulfated hyaluronic acid derivative useful for prevention and/or treatment of an allergic disease. An agent for prevention and/or treatment of an allergic disease selected from pollinosis, allergic rhinitis, allergic conjunctivitis, atopic dermatitis, and asthma, represented by the following general formula (IA) or (IB); wherein n represents a number of 0 to 15; R's each independently represent a hydrogen atom or an SO 3 H group etc.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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