(I) Anionic surfactant compound composition (a) of formula (I) [wherein, represents a C 4-36 hydrocarbyl group, a substituted or unsubstituted, R 1 is, R 5 and 3, R 4 R 2, R is each independently represent hydrogen atom or a C 1-4 alkyl group, one at least not hydrogen and R 5 3, R 4 R 2, R, M + and] represents a cation, (b) amphoteric surfactants the active agent, and a (c) alkoxylated nonionic species, the molar ratio of component (a) to component (b) is 0.5: 1 to 2: 1, the mass-to-component component (c) ( 1.2 ratio is less than the sum of the mass of the (b) and a): is 1, hypo-allergenic cleaning composition.(I)組成物(a)式(I)のアニオン性界面活性剤化合物[式中、R1は、置換又は非置換のC4-36ヒドロカルビル基を表し、R2、R3、R4及びR5はそれぞれ、水素原子又はC1-4アルキル基を独立に表し、R2、R3、R4及びR5の少なくとも1つは水素でなく、M+はカチオンを表す]と、(b)両性界面活性剤と、(c)アルコキシ化非イオン種とを含み、成分(a)対成分(b)のモル比が0.5:1~2:1であり、成分(c)の質量対成分(a)及び(b)の合算質量の比が1.2未満:1である、低刺激性洗浄組成物。
