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整髮化妝料
专利权人:
SHISEIDO COMPANY; LTD.
发明人:
SHIMIZU, HIDEKI,清水秀树,清水秀樹
申请号:
TW098137378
公开号:
TWI395597B
申请日:
2009.11.04
申请国别(地区):
TW
年份:
2013
代理人:
摘要:
The whole Hairization Makeup material of this Hair Ming Department mono- Seed, contain containing epithelium Gao Fen With sugar and/or sugar alcohol, characteristic in what:(A) 0.2 ~ 15 Quality amounts % of Wax, (D) liquid Body oils of 1 ~ 15 Quality amounts % of epithelium macromolecule, (B) sugar and/or 0.5 ~ 30 Quality amounts % of sugar alcohol, (C) Key containing ester Knot, and Jin and (E) (A) at divide Quality amount ratio As (B)/(As)=1/2 ~ 3 of the With (B) at the content divided, (F) (A) at divide Quality amount ratio As (C)/(As)=1/5 ~ 1 of the With (C) at the content divided, (G) (C) at divide With (D) at Quality amount ratio As (D)/(C)=1/2 ~ 3/2 for the content divided.This Hair bright purpose in what Ti Gong mono- Seed there is high fixed force Tong Time also to fill the whole Hairization Makeup material that part has both arrangement power. Ti makees the previous whole Hairization Makeup material Que Dot , And of As pursuits Gong Seed maos of Hairization Makeup material Qi useful whats of Very As of , of Yi and meets Come retail consumers expectation Head Hair moulding commodity in recent years.本發明係一種整髮化妝料,其含有皮膜性高分子與糖及/或糖醇,其特徵在於含有:(A)皮膜性高分子1~15質量%、(B)糖及/或糖醇0.5~30質量%、(C)含酯鍵結之蠟0.2~15質量%、(D)液體油分,且進而(E)(A)成分與(B)成分之含量的質量比為(B)/(A)=1/2~3、(F)(A)成分與(C)成分之含量的質量比為(C)/(A)=1/5~1、(G)(C)成分與(D)成分之含量的質量比為(D)/(C)=1/2~3/2。本發明之目的在於提供一種具有高固定力同時亦充份兼具整理力之整髮化妝料。提供一種毛髮化妝料,其極為有用於作為追求以往之整髮化妝料之缺點,並符合近年來消費者期待之頭髮造型用商品。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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