Analysis equipment is provided, which is capable of fulfilling a demand for miniaturization and ensuring high sensitivity, and which can be produced easily. The present invention relates to a method of continuously measuring a substrate concentration based on a response when a voltage is applied to a sensor. The present invention includes a response voltage application step of applying a response voltage E2 at which a response attributed to a substrate is obtained and a non-response voltage application step of applying a non-response voltage E1 at which the response attributed to the substrate is not obtained or is not substantially obtained. Preferably, the response voltage application step and the non-response voltage application step are repeated alternately.小型化の要求に応えつつ、高い感度を確保することができ、かつ簡易に製造することができる分析用具を提供する。本発明はセンサに電圧を印加したときの応答に基づいて基質濃度を連続測定する方法に関する。本発明は、基質に起因する応答が得られる応答電圧E2を印加する応答電圧印加ステップと、基質に起因する応答が全くあるいは実質的に得られない非応答電圧E1を印加する非応答電圧印加ステップと、を含んでいる。好ましくは、応答電圧印加ステップと非応答電圧印加ステップとを交互に繰り返し行なう。
