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DOSING DEVICE FOR GENERATING A GAS FLOW WITH AN ACTIVE SUBSTANCE FINELY DISPERSED IN THE LATTER
专利权人:
发明人:
MAYER STEFAN,KAMLAG YORICK
申请号:
IN5230/CHENP/2011
公开号:
IN2011CN05230A
申请日:
2011.07.19
申请国别(地区):
IN
年份:
2012
代理人:
摘要:
(1) Dosing device for generating a gas flow with an active substance finely dispersed in the latter. (2) The invention relates to a dosing device for generating a gas flow with an active substance (2) finely dispersed in the latter, as a result of an underpressure applied to a mouthpiece (6) of the dosing device, with a first gas flow channel (60, 61, 62, 63, 68), and with a dosing chamber (14) that can be fitted in the area of the first gas flow channel, and with a dosing chamber release mechanism which has a separating element (54, 76, 77) that can be moved between a closed position and an open position, wherein the first gas flow channel and/or a connection between the first gas flow channel and the dosing chamber is blocked when the separating element is in the closed position, and the first gas flow channel and/or the connection between the first gas flow channel and the dosing chamber is freed when the separating element is in the open position, and with a slide guide element (53, 55) on which the separating element (54, 7 6, 77) is movable between the closed position and the open position and can be driven by the underpressure applied to the mouthpiece, and wherein the separating element and/or the slide guide element is provided at least in the sliding contact area with a slide element (100a, 100b, 101) that influences the sliding friction properties. This design of the separating element and/or of the slide guide element ensures that the separating element is reliably triggered after a suction stream is generated, such that the function of the dosing device can be more precisely reproduced and is more reliable.
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