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Low-molecular polysulfated hyaluronic acid derivative and medicine containing same
专利权人:
Otsuka Chemical Co.; Ltd.
发明人:
Kakehi, Kazuaki,Asai, Hiroaki,Hayashi, Naohiro,Shimizu, Satoshi,Goto, Fumitaka,Koga, Yasuo,Tomoyasu, Takahiro,Taki, Takao,Kato, Yusuke,Nakazato, Satoru,Takaba, Junji,Azuma, Atsushi,Hirano, Wakako,Izum
申请号:
AU2010209200
公开号:
AU2010209200B2
申请日:
2010.02.01
申请国别(地区):
AU
年份:
2016
代理人:
摘要:
A low-molecular polysulfated hyaluronic acid derivative useful in the prevention and/or treatment of allergic diseases.Provided is a preventive and/or therapeutic agent for an allergic disease selected from pollinosis, allergic rhinitis, allergic conjunctivitis, atopic dermatitis, and asthma, the agent containing either a low-molecular polysulfated hyaluronic acid derivative represented by general formula (IA) or (IB) or a pharmaceutically acceptable salt thereof as an active ingredient.[In the formulae, n is a number of 0-15, and Rs each independently represents a hydrogen atom, an SO
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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