Low-molecular polysulfated hyaluronic acid derivative and medicine containing same

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专利权人:

Otsuka Chemical Co.; Ltd.

发明人:

Kakehi, Kazuaki,Asai, Hiroaki,Hayashi, Naohiro,Shimizu, Satoshi,Goto, Fumitaka,Koga, Yasuo,Tomoyasu, Takahiro,Taki, Takao,Kato, Yusuke,Nakazato, Satoru,Takaba, Junji,Azuma, Atsushi,Hirano, Wakako,Izum

申请号：

AU2010209200

公开号：

AU2010209200B2

申请日:

2010.02.01

申请国别(地区):

AU

年份:

2016

代理人:

摘要：

A low-molecular polysulfated hyaluronic acid derivative useful in the prevention and/or treatment of allergic diseases.Provided is a preventive and/or therapeutic agent for an allergic disease selected from pollinosis, allergic rhinitis, allergic conjunctivitis, atopic dermatitis, and asthma, the agent containing either a low-molecular polysulfated hyaluronic acid derivative represented by general formula (IA) or (IB) or a pharmaceutically acceptable salt thereof as an active ingredient.[In the formulae, n is a number of 0-15, and Rs each independently represents a hydrogen atom, an SO

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