ГАНН Юэн Томас Грэхем Экман (US),УОЛТЕРС Рассел М. (US),ГАНДОЛЬФИ Лиза Р. (US),ЛЭЙХИ Кевин К. (US)
申请号：
RU2013103070/15
公开号：
RU2013103070A
申请日:
2011.06.23
申请国别(地区):
RU
年份:
2014
代理人:
摘要：
1. Cleansing composition for the skin comprising: (a) low molecular weight linear non-crosslinked acrylic copolymer and (b) a surfactant component comprising at least one non-ethoxylated anionic surfactant and at least one amphoteric surfactant, wherein the total surfactant content of said cleaning composition to the skin is not more than about 14% by weight. cleansing composition for the skin wherein pH of said cleaning composition to the skin is about 6.2 or less and a cleansing composition for the skin has a sampling frequency of about 70,000 cps or less in the test on scattering sveta.2. Cleansing composition for the skin comprising: (a) a low molecular weight non-crosslinked acrylic copolymer and (b) a surfactant component comprising at least one non-ethoxylated anionic surfactant and at least one amphoteric surfactant, wherein the total content of surfactant component in said cleaning composition for skin is less than about 14% by weight. cleansing composition for the skin wherein pH of said cleaning composition to the skin is about 6.2 or less and a cleansing composition for the skin has a transmittance value greater than about 90% .3. Cleansing composition for the skin according to claim 1, wherein at least one non-ethoxylated anionic surfactant and at least one amphoteric surfactant present in a ratio of less than 0.5, and a pH of from about 4.8 to about 6,2.4. Cleansing composition for the skin according to claim 1, wherein at least one non-ethoxylated anionic surfactant and at least one amphoteric surfactant present in a ratio greater than 0.5 and less than about pH 61. Очищающая композиция для кожи, содержащая:(a) низкомолекулярный несшитый линейный акриловый сополимер и(b) поверхностно-активный компонент, содержащий по меньшей мере одно неэтоксилированное анионное ПАВ и по меньшей мере одно амфотерное ПАВгде общее содержание ПАВ в указанной очищающей композиции для кожи составляет не более приблизительно 14% вес. очищающей композиции для кожи причем pH
