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A METHOD OF MAKING A MULTILAYER STRUCTURE
专利权人:
Rohm and Haas Electronic Materials LLC ;DOW GLOBAL TECHNOLOGIES LLC
发明人:
Wang Deyan,Wang Xiuyan,Feng Shaoguang,Li Qiaowei,Pang Qingqing,Trefonas, III Peter,Lu Zhijian,Chen Hongyu
申请号:
US201515764543
公开号:
US2018286598(A1)
申请日:
2015.09.29
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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