您的位置: 首页 > 农业专利 > 详情页

DISPOSITIF DE PLANIFICATION DE TRAITEMENT, PROCÉDÉ DE PLANIFICATION DE TRAITEMENT, DISPOSITIF DE COMMANDE ET SYSTÈME DE TRAITEMENT À FAISCEAU DE PARTICULES
专利权人:
Ltd.;Hitachi
发明人:
申请号:
EP17153697.2
公开号:
EP3199202A1
申请日:
2017.01.30
申请国别(地区):
EP
年份:
2017
代理人:
摘要:
In a case of continuous beam irradiation, irradiation cannot be performed by raising beam intensity. Consequently, a treatment time tends to be lengthened.A spot determination unit 1 classifies an irradiation region to be irradiated with a charged particle beam into a plurality of layers 52 in an irradiation direction of the charged particle beam, and arranges a plurality of irradiation spots 53 in the plurality of layers 52. A group classification unit 2 classifies the irradiation spots into groups in accordance with at least either a distance between one irradiation spot and another irradiation spot which are arranged in the same layer or a target irradiation dose of each irradiation spot. A planning unit 3 prepares a plan so as to continuously emit the charged particle beam while the irradiation position is changed from an irradiation spot belonging to a certain group to a subsequent irradiation spot, and so as to stop emitting the charged particle beam while the irradiation position is changed from an irradiation spot belonging to a certain group to an irradiation spot belonging to another group located in the same layer as that of the certain group. In this manner, the above-described problem is solved.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充