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Process for Reducing Residual Surface Material from Porous Polymers
专利权人:
Nai-Hong Li
发明人:
Nai-Hong Li,Yuchiong Hsuanyu,James R. Benson,Marc Freed
申请号:
US13318738
公开号:
US20120309851A1
申请日:
2010.05.04
申请国别(地区):
US
年份:
2012
代理人:
摘要:
The present invention relates to methods for removing residual surface material from porous polymerized particle surfaces. The particles thus produced have an increase in surface porosity and uniformity in a variety of applications. Desirably, substantially the entire surface communicates with the interior of the particles. Also provided are the particles produced by such methods, further modifications of such particles, and methods for using the particles in a variety of applications. All described methods, compositions, and articles of manufacture are within the scope of the invention.
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