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Gas mist pressure bath system
专利权人:
Shoichi Nakamura;ACP Japan Co., Ltd.
发明人:
Nakamura, Shoichi
申请号:
AU2010211679
公开号:
AU2010211679B2
申请日:
2010.02.03
申请国别(地区):
AU
年份:
2014
代理人:
摘要:
Disclosed is a gas mist pressure bath system that can control the amount, pressure, etc., of gases and liquids and allow gas mists to be absorbed from the skin and mucosa of live bodies in an optimal state. The system is configured with a gas supply means (11), a gas mist supply means (31) that forms and supplies gas mist by atomizing and dissolving liquids and gases supplied by said gas supply means (11), a live body covering member (41) that covers said skin and mucosa of a living body and forms a space that seals the gas mist supplied from said gas mist supply means (31) therein. The gas mist supply means (31) is provided with a liquid reservoir (32B), a gas mist reservoir (32A), a nozzle (33) that dispenses a gas from a tip opening, a liquid intake tube (36A) that draws up a liquid to the tip of the nozzle (33), and a collision member (35) provided opposite the nozzle (33). Gas mist is formed by the gas dispensed from the nozzle (33) causing the liquid drawn up to the tip of the nozzle (33) by the liquid intake tube (36A) to collide with a collision member (35) and to be atomized and dissolved.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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