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Device to adjust gas concentration in fluids
专利权人:
Murthy Tata
发明人:
Murthy Tata
申请号:
US14933067
公开号:
US09857342B2
申请日:
2015.11.05
申请国别(地区):
US
年份:
2018
代理人:
摘要:
A device to adjust concentration of a first gas in a fluid to a target concentration (Cf) is provided. The device includes a container, having a first opening, the container is configured to receive a first volume (VL) of the fluid through the first opening. Wherein the fluid has an initial concentration (Ci) of the first gas and a second volume (VC) of the container is determined based on the initial concentration (Ci) of the first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL), and configured to adjust pressure in the container at a predetermined pressure of the first gas to adjust the first gas concentration in the fluid to the target concentration (Cf); wherein the second volume (VC) and the first volume (VL) are correlated by:VCVL=1Φ[MCfVL+CiCf-1]+1 in that M is an amount of the first gas required to be introduced in the container to adjust the first gas concentration in the fluid to the target concentration (Cf).
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