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基礎化粧水
专利权人:
宍戸;武義
发明人:
宍戸 武義
申请号:
JP2011126787
公开号:
JP5350434B2
申请日:
2011.06.06
申请国别(地区):
JP
年份:
2013
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a skin lotion in which content components are carefully selected so as to increase water holding capacity and moisture retention potential without damaging the power included in water (power of natural water) though having alkaline, and which exhibits excellent functions as a fundamental skin lotion with few materials.SOLUTION: The fundamental skin lotion is obtained by mixing alkaline hot spring water, phenoxyethanol, collagen, elastin, a placental extract, pentylene glycol, glycerin and butylene glycol, and the liquid obtained by mixing them is alkaline.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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