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X-ray thin film inspection device
专利权人:
RIGAKU CORPORATION
发明人:
Kiyoshi Ogata,Sei Yoshihara,Takao Kinefuchi,Shiro Umegaki,Shigematsu Asano,Katsutaka Horada,Muneo Yoshida,Hiroshi Motono,Hideaki Takahashi,Akifusa Higuchi,Kazuhiko Omote,Yoshiyasu Ito,Naoki Kawahara,A
申请号:
US15518892
公开号:
US10473598B2
申请日:
2014.10.14
申请国别(地区):
US
年份:
2019
代理人:
摘要:
An X-ray thin film inspection device of the present invention includes an X-ray irradiation unit 40 installed on a first rotation arm 32, an X-ray detector 50 installed on a second rotation arm 33, and a fluorescence X-ray detector 60 for detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unit 40 includes an X-ray optical element 43 comprising a confocal mirror for receiving X-rays radiated from an X-ray tube 42, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanism 46 for passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element 43.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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