This invention provides a charged particle beam irradiation control device and a charged particle beam irradiation method for quickening the change-over of charged particle beams between irradiated and non-irradiated conditions while stabilizing the charged particle beams to be emitted. Accelerating voltage in the irradiated condition of the charged particle beams is set as a reference accelerating voltage, and the accelerating voltage is changed over into set accelerating voltage which is higher or lower than the reference accelerating voltage, such that the track of the charged particle beams is changed to make the charged particle beams (R0) collide on other objects, thereby setting the charged particle beams into the non-irradiated condition. Since the non-irradiated condition can be established only by changing over the accelerating voltage to be higher or lower, the change-over between the irradiated and non-irradiated conditions can be quickened. In addition, since there is no need for ON/OFF control of arc discharge of an ion source (21), the charged particle beams can be stabilized without being influenced by the instable rise of the arc discharge.本發明之目的,係在於提供一種:在謀求帶電粒子束之照射狀態/非照射狀態之切換之高速化的同時,亦能夠謀求被射出之帶電粒子束之穩定化的帶電粒子束照射控制裝置及帶電粒子束照射方法。將帶電粒子束之照射狀態之加速電壓設為基準加速電壓,並藉由將加速電壓切換為大於或小於基準加速電壓之設定加速電壓,來改變帶電粒子束之軌道,並使帶電粒子束(R0)衝撞到其他物體,從而將帶電粒子束設為非照射狀態。由於僅藉由將加速電壓切換為較大或較小即可設為非照射狀態,故可以謀求照射狀態/非照射狀態切換之高速化。又,由於無需進行離子源(21)之電弧放電之ON/OFF控制,故不受電弧放電上升時不穩定性之影響,可以謀求帶電粒子束之穩定化。2...迴旋加速器25...對抗電極26...對抗電極27...對抗電極28...對抗電極21...離子源23...加速電極24...加速電極31...中心電極32...中心電極33...中心電極34...相位細縫R0...帶電粒子束R1...周圍軌道R2...軌道
