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Resorcinol Derivatives with sulfur, its preparation and its uses in Cosmetics.
专利权人:
发明人:
申请号:
UAA201112908
公开号:
UA109770C2
申请日:
2010.04.08
申请国别(地区):
UA
年份:
2015
代理人:
摘要:
The present Invention relates to a compound of General formula (1) where: x = S, so or SO2,And one of the Radicals R1 and R2 represents a hydrogen Atom, and the other, a linear or branched alkyl radical in C1 to C18 eventually replaced by one or several Halogen Atoms; alquenilo linear or branched at C2 to C15 eventually substituted by one or more of a Halogen Atoms; Ralquilo eventually substituted by one or more alkoxy groups in C1 to C6 or cor3 or conhr3,But not simultaneously.The R3 represents a linear or branched alkyl radical in C1 to C18 eventually replaced by one or several Halogen Atoms; alquenilo linear or branched at C2 to C18 eventually replaced by one or several Halogen Atoms; a aralquilo eventually replaced by one or several Alkoxy groups in C1 to C6 a aralquenilo eventually substituted by one or more alkoxy groups in C1To C6 and / or Oh groups; or an aryl radical eventually substituted by one or more alkoxy groups in C1 to C6.Claim 1: pharmaceutical or cosmetic composition, which comprises as an active principle at least one Compound of formula (1) or formula (1) as defined according to any one of claims 1 to 8 in association with a Pharmaceutical excipient or cosm u00e9ticament And acceptable.Reivindicacion18: preparation of a compound of General formula (1) According to any one of claims 1 to 7, wherein is reacting 4,4 '- tiodibencen - L, 3dioi or 4,4' - sulfinilbis - L3 - bencenodiol with a Halide of formula II Hal R1 (ii) in which: Hal R1 represents a Halogen Atom and have the same meaning as given in claim 1, with the exception of an atom of hydrogen.(I)Даний винахід стосується сполуки загальної формули (І), де: X=S, SO або SO; і один з радикалів Rі Rє атомом водню, а інший позначає радикал: C-Cнормальний або розгалужений алкіл, необов'язково заміщений одним чи більш ніж одним атомом галогену; С-Снормальний або розгалужений алкеніл, необов'язково заміщений одним чи більш ніж одним атомом галогену; аралкіл, необов'язково заміщений однією чи більш н
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