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Cosmetic Use of N-Heteroarybisamide Analogs and Related Compounds
专利权人:
Nancy T. Ilaya;Satish Parimoo;John W. Lyga
发明人:
Satish Parimoo,Nancy T. Ilaya,John W. Lyga
申请号:
US13285458
公开号:
US20130109691A1
申请日:
2011.10.31
申请国别(地区):
US
年份:
2013
代理人:
摘要:
Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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