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Basin for pedicure spa apparatus
专利权人:
Quy That Ton
发明人:
Quy That Ton
申请号:
US12171659
公开号:
US08918924B2
申请日:
2008.07.11
申请国别(地区):
US
年份:
2014
代理人:
摘要:
Disclosed are various embodiments of systems and methods directed to a pedicure spa apparatus. A pedicure spa can include a basin having an embedded light aperture on a first interior surface of the basin. The embedded light aperture can further includes a light passing layer configured to fluidically seal the embedded light aperture and be substantially seamless with the first interior surface of the basin. The pedicure spa can also include a water agitation device coupled to an interior surface of the basin and a magnetic actuator coupled to an opposing surface of the interior surface.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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