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荷電粒子ビーム照射システム
专利权人:
株式会社日立製作所
发明人:
森山 國夫,中山 尚英,西内 秀晶
申请号:
JP2007330297
公开号:
JP5074915B2
申请日:
2007.12.21
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
A charged particle beam irradiation system comprises a high-speed steerer (beam dump device) 100 disposed in a course of a beam transport line 4 through which an ion beam is extracted from a charged-particle beam generator 1. The beam dump device 100 is provided with dose monitoring devices 105, 106 for measuring a dose of an ion beam applied to a beam dump 104 so that the intensity of the ion beam can be measured without transporting the ion beam to irradiation nozzles 15A through 15D. Thus, the system is capable of adjusting the intensity of an ion beam extracted from a synchrotron without operating each component of a beam transport line, and an irradiation nozzle.
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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