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OPHTHALMIC MEASUREMENT DEVICE, AND OPHTHALMIC MEASUREMENT SYSTEM EQUIPPED WITH OPHTHALMIC MEASUREMENT DEVICE
专利权人:
NIDEK CO.; LTD.
发明人:
Kazunari Shimizu
申请号:
US14390279
公开号:
US20150055088A1
申请日:
2013.04.05
申请国别(地区):
US
年份:
2015
代理人:
摘要:
An ophthalmic measurement device to simulate a retinal image of an examinee's eye includes an ocular aberrometer for measuring an aberration of the eye and a calculation control unit for analyzing aberration data obtained by the ocular aberrometer on the naked eye. The calculation control unit calculates subjective correction data intended for a prescription based on a subjective value by obtaining the difference in each meridian direction between a refraction value in the aberration data and a new subjective value of the eye as obtained by a subjective optometry device, obtains a second polynomial equation wherein the coefficient that represents the refraction value among the coefficients of a first polynomial equation used for approximating the aberration data is replaced with a coefficient corresponding to the subjective correction data, back-calculates the aberration data by using the second polynomial equation, and generates a simulation image based on the back-calculated aberration data.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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