Metal deposition inhibitor

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专利权人:

株式会社林原

发明人:

大村 恵昭,福田 恵温,下津浦 康裕

申请号：

JP2001067281

公开号：

JP4982648B2

申请日:

2001.03.09

申请国别(地区):

JP

年份:

2012

代理人:

摘要：

PROBLEM TO BE SOLVED: To obtain a metal deposition inhibitor readily administrable for regular use, capable of effectively preventing, alleviating and treating a metal poisoning, having high safety. SOLUTION: This metal deposition inhibitor comprises a processed substance of a plant of the family Umbelliferae and trehalose and/or maltitol as active ingredients.

来源网站：

中国工程科技知识中心

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http://www.ckcest.cn/home/