< Constitution >The sulfur content ligand, and these the metal and/or making the main group element join, the fluid, the solid, the vapor and/or it is the manner which is removed from system. General constitutional formula of this invention ligand (A) or (B) is. In formula, R to be the basis which is chosen from the group which consists of benzene, pyridine, pyridine 4 on, naphthalene, the anthracene, phenanthrene and the alkyl group, R hydrogen, alkyl, aryl and the carboxyl group, to be the basis which is chosen from the group which consists of karubokishiretoesuteru, the organicity basis and the biological basis, R alkyl, aryl and the carboxyl group, to be the basis which is chosen from the group which consists of karubokishiretoesuteru, the organicity basis and the biological basis, as for X hydrogen, lithium, the sodium, the kalium, rubidium, the cesium and francium, alkyl, aryl and the carboxyl group, karubokishiretoesuteru and the thio phosphorus acid chloride (ester), N acetylCystein and merukaputo acetic acid, the mercaptopropionic acid and the thio salicyl acid chloride (ester), it is the basis which is chosen from the group which consists of the organicity basis and the biological basis, n other things 1 - 10 is unrelated, m is 1 - 6, Y is the basis which is chosen from the group which consists of hydrogen, the polymer, the silica and the silica support substrate, and as for Z hydrogen, alkyl, aryl and the carboxyl group, karubokishiretoesuteru and the hydroxyl basis, NH, HSO, halogen, the carbonyl group, the organicity basis and the biological basis, the basis which is chosen from the group which consists of the polymer, the silica and the silica support substrateSo it is.< Choice figure >Drawing 1【構成】イオウ含有配位子、およびこれらを金属および/または主族元素に結合させて流体、固体、気体および/または組織から除去する方法である。本発明配位子の一般構造式(A)または(B)である。式中、R1はベンゼン、ピリジン、ピリジン-4-オン、ナフタレン、アントラセン、フェナントレンおよびアルキル基からなる群から選択される基であり、R2は水素、アルキル、アリール、カルボキシル基、カルボキシレートエステル、有機基および生物学的基からなる群から選択される基であり、R3はアルキル、アリール、カルボキシル基、カルボキシレートエステル
