Topical treatment of radiation dermatitis using hamelia patens

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专利权人:

L.L.C.;BERRY PHARMACEUTICALS

发明人:

Don Wayne Berry

申请号：

US13815957

公开号：

US09345736B2

申请日:

2013.03.16

申请国别(地区):

US

年份:

2016

代理人:

摘要：

Topical compositions are provided useful for treating radiation dermatitis. The compositions comprise an extract of the plant Hamelia patens and are applied topically to skin having radiation dermatitis to relieve symptoms thereof.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/