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Methods for forming implants with selectively exposed mesh for fixation and related implants
专利权人:
Guilhem Denoziere
发明人:
Guilhem Denoziere,Daniel Tomko,Anish Ghodadra
申请号:
US12977336
公开号:
US08475503B2
申请日:
2010.12.23
申请国别(地区):
US
年份:
2013
代理人:
摘要:
Methods for forming molded orthopedic implants with at least one mesh substrate having opposing upper and lower primary surfaces. At least a major portion of the mesh substrate lower primary surface is integrally moldably attached to the molded implant body. The methods are carried out so that the mesh substrate has at least one selectively exposed region devoid of molded material that exposes at least a portion of the mesh substrate upper surface to at least a partial thickness of the mesh substrate so as to allow for tissue in-growth in the at least one exposed region of the mesh substrate.
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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