Dosage form for high dose-high solubility active ingredients that provides for immediate release and modified release of the active ingredients

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专利权人:

Navin Vaya

发明人:

Navin Vaya,Rajesh Singh Karan,Sunil Sadanand Nadkarni,Vinod Kumar Gupta

申请号：

US11134633

公开号：

US08263125B2

申请日:

2005.05.19

申请国别(地区):

US

年份:

2012

代理人:

摘要：

A dosage form comprising of a high dose, high solubility active ingredient as modified release and a low dose active ingredient as immediate release where the weight ratio of immediate release active ingredient and modified release active ingredient is from 1:10 to 1:15000 and the weight of modified release active ingredient per unit is from 500 mg to 1500 mg a process for preparing the dosage form.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/