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可服貼臉部輪廓之面膜
专利权人:
发明人:
林宇岳,林宇岳
申请号:
TW102137179
公开号:
TWI510257B
申请日:
2013.10.15
申请国别(地区):
TW
年份:
2015
代理人:
摘要:
A facial mask capable of closely fitting a face contour is disclosed, wherein a chin fitting area corresponding to the face chin is located at the bottom of the vertical center axis of a planar facial mask and recessed inwardly in the direction of the mouth. This chin fitting area has a transversely long shape with a height of about 0.5~1.5 cm and a width of about 8~10 cm, and is symmetric about the vertical center axis, wherein a cutout portion can be formed on the mask body of the chin fitting area, or at least one transverse and/or plural longitudinal or diagonal cutout lines are distributed over the mask body of the chin fitting area, so as to allow the chin fitting area to fit the U-shaped contour of the chin, thereby forming a W-shaped complete fitting state. Furthermore, two arc-shaped sideburn cutout portions are disposed on both sides of the facial mask that respectively correspond to the two sideburns of the face to avoid the hair growth sites and used as a reserved space for covering and extending the mask. Thereby, the planar mask can match and closely fit the face contour to avoid generation of wrinkles, bumps or overlapping, so as to enhance the convenience and efficiency of the mask in usage and relatively enhance the value sense and legibility of the planar mask in the competing market of facial mask.一種可服貼臉部輪廓之面膜,其係在該平面狀面膜之垂直中心軸線下方且對應臉部下巴位置設置一向臉部嘴部方向內凹高度約0.5~1.5cm及寬度約8~10cm並對應該垂直中心軸線呈兩側對稱之橫長狀下巴服貼區,其中該下巴服貼區之面膜體可被裁除以形成一下巴缺口部,或在該下巴服貼區之面膜體上佈設至少一條橫向及/或多條縱向或斜向之切口線,使該下巴服貼區能對應貼合呈U字型之下巴輪廓,而形成呈W字型之完整貼合狀態;另於該面膜之兩側且對應臉部兩側鬢角之位置分別設置一弧型鬢角缺口部,供在使用時用以避開鬢角處之毛髮生長部位並供作為在覆蓋並延展面膜用之預留空間;藉此使該平面狀面膜能配合並服貼在臉部輪廓上以避免皺褶、凸起或重疊的產生,藉以增進該面膜使用之便利性及使用效率,並在面膜競爭市場相對提昇該平面狀面膜之價值感及辨識性。10‧‧‧面膜Z‧‧‧垂直中心軸線11‧‧‧眼部開口12‧‧‧鼻狀切口線13‧‧‧嘴部開口14‧‧‧三角狀開口20‧‧‧下巴服貼區30‧‧‧弧型鬢角缺口部
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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