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Production method of subcutaneous implantable port
专利权人:
日本コヴィディエン株式会社
发明人:
▲高▼木 勝正
申请号:
JP2010189227
公开号:
JP5706113B2
申请日:
2010.08.26
申请国别(地区):
JP
年份:
2015
代理人:
摘要:
A subcutaneous implantable port (11) is provided and includes a housing, septum, bottom plate and catheter connecting portion. The housing has a closed base (31) having a recess portion and a cover for covering the base. A bottom plate made from a material harder than the base is disposed on a bottom portion of an inner surface of the base. The bottom plate includes a plurality of corner portions (43) on an outer peripheral edge portion thereof. The plurality of corner portions bite into an inner surface of the recess portion from the circumferential direction of the bottom plate to affix the bottom plate to the base.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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