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Optical model selection method, detected light amount distribution correction method, optical model correction method, and optical inspection apparatus
专利权人:
株式会社リコー
发明人:
石井 稔浩,▲高▼橋 陽一郎,佐々木 俊英,藤原 将行
申请号:
JP2016027491
公开号:
JP6723510B2
申请日:
2016.02.17
申请国别(地区):
JP
年份:
2020
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide an optical inspection device that can improve inspection accuracy.SOLUTION: An optical inspection method of a first embodiment inspecting a subject using an optical sensor including an irradiation system plurally containing a light source module LM, and a detection system plurally containing a detection module DM detecting an amount of light of light with which a measurement object is irradiated from the irradiation system and propagating in the measurement object includes the steps of: obtaining a first detection light-amount distribution serving as a detection light-amount (a light-amount distribution) for each of a plurality of optical models simulating the subject by a simulation virtually using the optical sensor; obtaining a second detection light-amount distribution serving as a detection light-amount (a light-amount distribution) of the subject using the optical sensor; and comparing the first detection light-amount distribution with the second detection light-amount distribution, and selecting the optical model suitable for the subject from the plurality of optical models.SELECTED DRAWING: Figure 16
来源网站:
中国工程科技知识中心
来源网址:
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