Mark D. Ediger,Stephen Swallen,Ken Kearns,Lian Yu,Tian Wu
申请号：
US12040242
公开号：
US08329218B2
申请日:
2008.02.29
申请国别(地区):
US
年份:
2012
代理人:
摘要：
The present invention provides vapor deposition methods that overcome the kinetic restrictions imposed by more conventional vapor deposition processes and liquid-cooling techniques to form amorphous molecular solids with greatly enhanced stabilities. The present methods produce amorphous molecular solids having stabilities, as measured by fictive temperature, that cannot be achieved using liquid-cooling methods.
