PARK, HAE DUCK,박해덕,JUNG, EUN KYUNG,정은경,KIM, TAE HO,김태호,BAE, MI RAN,배미란
申请号：
KR1020120050019
公开号：
KR1020130126158A
申请日:
2012.05.11
申请国别(地区):
KR
年份:
2013
代理人:
摘要：
The present invention relates to a method for manufacturing a biomedical electrode. The present invention provides the method includes: a surface treatment process of surface-treating a core material； an etching process of providing the surface of the core material with roughness by depositing the surface-treated core material in a chromic acid anhydride solution； a neutralization process of removing chrome, which has been used in the etching process, by depositing the core material, which has passed through the etching process, in a neutralization treatment solution； a catalytic treatment process of forming the surface of the core material to be capable of being plated with silver (Ag) by depositing the core material, which has passed through the neutralization process, in a catalytic treatment solution including a metal precursor and a tin precursor； a catalytic activation process of removing a tin component, which has been used in the catalytic treatment process, by depositing the core material, which has passed through the catalytic treatment process, in a tin removing solution； a silver (Ag) plating process of forming a silver (Ag) plating layer by depositing the core material, which has passed through the catalytic activation process, in a silver (Ag) plating solution； a silver chloride (AgCl) layer forming process of forming a silver chloride (AgCl) layer on the silver (Ag) plating layer by depositing the core material, which has been plated with the silver (Ag), in a silver chloride (AgCl) layer forming solution； and a stabilization process of stabilizing the silver chloride (AgCl) layer by depositing the core material, on which the silver chloride (AgCl) layer is formed, in a stabilization treatment solution including sodium chloride. [Reference numerals] (AA) After forming and stabilizing an AgCl layer본 발명은 생체 의료용 전극의 제조방법에 관한 것이다. 본 발명은 심재를 표면 처리하는 표면 처리공정； 상기 표면 처리된 심재를 무수 크롬산 용액에 침적하여, 심재의 표면에 거칠기를 부여하는 에칭공정； 상기 에칭공정을 거친 심재를 중화 처리액에 침적하여, 에칭공정에서 사용된 크롬
