A system for photoaltering a region of a material, the region having a first and second portions and a periphery, the system comprising a laser configured to produce a pulsed laser beam, a controller configured to select at least a first pattern and a second pattern, the first pattern having a first maximum acceleration associated with the second portion, the second pattern having a second maximum acceleration associated with the second portion, the second maximum acceleration being less than the first maximum acceleration and a scanner operable in response to the controller to scan the pulsed laser beam in the first portion of the region with the first pattern and scan the pulsed laser beam in the second portion of the region with the second pattern, wherein the second pattern comprises scanning the pulsed laser beam in a raster pattern.
