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DIFFUSION BARRIER FOR IMPLANTABLE ELECTRODE LEADS
专利权人:
BIOTRONIK SE &; Co. KG
发明人:
Eckardt Bihler,Marc Hauer
申请号:
US16429892
公开号:
US20190392964A1
申请日:
2019.06.03
申请国别(地区):
US
年份:
2019
代理人:
摘要:
A process for producing an electrical conductor structure that involves embedding at least one metallic conductor track and at least one heating conductor in an electrically insulating substrate, and producing an electric current in the heating conductor so that a first layer of the substrate and a second layer of the substrate fuse in an area surrounding the heating conductor, to seal an interface between the two layers. A conductor structure is also disclosed, in particular in the form of an implantable electrode lead.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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