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Method for producing silicon microneedle arrays with holes and microneedle array
专利权人:
发明人:
Michael Stumber
申请号:
US13706523
公开号:
US09555229B2
申请日:
2012.12.06
申请国别(地区):
US
年份:
2017
代理人:
摘要:
A method for producing silicon microneedle arrays with drilled holes includes producing a silicon microneedle array. For each microneedle in a plurality of microneedles in the microneedle array, a laser is positioned relative to a microneedle and a drilled hole is drilled into the microneedle array by laser drilling. The drilled holes are drilled in microneedles, in flanks of the microneedles or alongside microneedles. A microneedle array includes a substrate composed of a micromechanical semiconductor material. The microneedle array has microneedles that project from the substrate and has drilled holes. The microneedles are composed of a porous micromechanical semiconductor material.
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