Jody L. Seifert,Luiz Pimenta,Michael L. Boyer, II,David C. Paul
申请号：
US11691357
公开号：
US09545267B2
申请日:
2007.03.26
申请国别(地区):
US
年份:
2017
代理人:
摘要：
In an exemplary embodiment, the present invention discloses interspinous process spacers that can be placed between adjacent spinous processes for minimally invasive surgical treatment of a spinal disease or defect. In particular, the present invention, in one embodiment, discloses an interspinous process spacer having a distraction end, a central support portion, and a trailing end. Also disclosed in the present invention are systems and kits including such implants, methods of inserting such implants, and methods of alleviating pain or discomfort associated with a spinal column disease or defect.
