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荷電粒子照射装置および方法
专利权人:
イオン ビーム アプリケーションズ
发明人:
クラエレボウドト,イヴ,サイヴェ,グレゴリー
申请号:
JP2013501833
公开号:
JP2013523234A
申请日:
2011.03.30
申请国别(地区):
JP
年份:
2013
代理人:
摘要:
Treatment policy to a method charged particle irradiation system for irradiating (50) the target volume (10), defines a (140) irradiation point defined series with a dose that is defined to be supplied, respectively ( at least is disposed between the target volume and 110) (50) it is adapted to receive a 70), scanning one magnet (at least 100 (100 the scanning magnet illumination unit having a 110) and (40) apparatus and method provide beam position monitor a single (130). When the magnetic configuration corresponding applies, to point the irradiation point that is the prescribed (90) beam, a controller (80), the irradiation point that is the provision of any corresponding to the nominal magnetic configuration of the scan magnet and means for calculating the expected position corresponding to the (130) the beam position monitor and for calculating and for. Identify the tuning dose defined to be applied to the tuning reference point and means for selecting from the irradiation point defined in the series: a) tuning the reference point further, the controller (80), is b) the selected and means for, means less than or is equal to the dose has been specified above in the tuning reference point tuning doses that are specified above is the selected beam given c) beam position monitored by the (130) for tuning the reference point and means for comparing the expected position in (130) the beam position monitor for tuning reference point said selected position, being d) the selection of the beam position monitor in (130) In order to align the beam position given by the beam position monitor in position to be expected, the scanning magnet means for calculating the first correction to be applied to the nominal magnetic set (100 110), and e and a means for correcting the nominal magnetic configuration of the scanning magnet for irradiation point that is the provision of all according to the correction of the) first. [Selection] Figure Figure 1標的容積(50)に照射するための荷電粒子照射装置(10)および方法であ
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