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Procédés de formation d'un dispositif d'électrode avec impédance réduite
专利权人:
Inc.;NeuroNexus Technologies
发明人:
申请号:
EP12006458.9
公开号:
EP2570153B1
申请日:
2012.09.14
申请国别(地区):
EP
年份:
2017
代理人:
摘要:
Improved low-cost, highly reliable methods for increasing the electrochemical surface area of neural electrodes are described. A mono-layer of polymeric nanospheres is first deposited on a metallization supported on a dielectric substrate. The nanospheres self-assemble into generally repeating lattice forms with interstitial space between them. Then, the geometric surface area of the metallization material is increased by either selectively etching part-way into its depth at the interstitial space between adjacent nanospheres. Another technique is to deposit addition metallization material into the interstitial space. The result is undulation surface features provided on the exposed surface of the metallization. This helps improve the electrochemical surface area when the treated metallizations are fabricated into electrodes.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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