The invention relates to a device (100) for RF skin treatment, comprising an active electrode (1) arranged on an operational side (15) of the device and having a first skin contact surface for contact with a skin of a user, which first skin contact surface has a largest cross-sectional dimension smaller than or equal to 2 mm. The device comprises a return electrode (2) arranged on the operational side (15) of the device and having a second skin contact surface for contact with the skin of the user, wherein an area of the second skin contact surface is at least five times larger than an area of the first skin contact surface. An RF generator (21) is arranged to supply an RF treatment voltage between the active electrode (1) and the return electrode (2) so as to heat a skin region below the active electrode, wherein the RF treatment voltage has a frequency in a range of 100 MHz-3 GHz. By using a frequency of the RF treatment voltage in said range, a depth of thermal lesions voltage is considerably increased as compared to RF skin treatment devices using a comparable RF treatment voltage, but at a much lower frequency.
