高分子化合物

• 收藏
• 分享

专利权人:

信越化学工業株式会社

发明人:

畠山 潤,長谷川 幸士,船津 顕之

申请号：

JP20150118914

公开号：

JP6065942(B2)

申请日:

2015.06.12

申请国别(地区):

日本

年份:

2017

代理人:

摘要：

PROBLEM TO BE SOLVED: To provide a polymer compound that can reduce outgassing in EUV exposure, reduce LWR after image development, and prevent the occurrence of a blob defect, the polymer compound added to resist material.SOLUTION: This invention provides a polymer compound represented by formula (2) with a weight average molecular weight of 1,000-500,000 (where, v is 1 or 2; 0

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/