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Cleaning ingredients and enhancers containing trace metals
专利权人:
UNILEVER N.V.
发明人:
NITISH KUMAR,DIVYA PARUCHURI,AJIT MANOHAR AGARKHED
申请号:
ARP150100233
公开号:
AR099203A1
申请日:
2015.01.28
申请国别(地区):
AR
年份:
2016
代理人:
摘要:
In One aspect, it describes a Cleaning composition which includes: (i) a Surfactant; and (ii) a oligodin u00e1mico or metal ions; (iii) a chelating Agent and a Polymer that has a group that includes a site that has one or more Lone pairs of electrons; where d Said Surfactant Is SOAP.The Polymer has a group that includes a site that has one or more Lone pairs of electrons of the metal oligodin u00e1mico Power the antimicrobial efficacy.Claim 1: a Cleaning composition which includes: (i) a Surfactant; and (ii) a metal oligodin u00e1mico; (iii) a chelating Agent and a Polymer that has a group that includes a site that has one or more Lone pairs of electrons; wherein Said Age Nte Surfactant Is SOAP.Claim 2: a Cleaning composition according to claim 1, wherein Said Polymer is Polyvinyl Acetate and polyvinylpyrrolidone, polyvinyl alcohol, or a Copolymer of them. Claim 3: a Cleaning composition according to claim 1 or 2, ranging from 1 00000 to 5% by weight of metal oligodin u00e1mico.Claim 4: a Cleaning composition according to any of the preceding Claims, wherein the metal is selected from Silver, Copper, zinc and Gold.Claim 7: a Cleaning composition according to any of the preceding Claims, wherein Said chelating Agent Ethylenediaminetetraacetic acid (EDTA), is disuccinato ethylenediamine (EDDS), N, N - (carboxymethyl) glutamic acid bis (GLDA), dieti acid Lentriaminopentaac u00e9tico (DTPa), nitrilotriacetic acid (NTA) or acid etanoldiglicinico (EDG).En un aspecto, se describe una composición de limpieza que comprende lo siguiente: (i) un agente tensoactivo; (ii) un metal oligodinámico o sus iones; (iii) un agente quelante; y un polímero que tiene un grupo que comprende un sitio que posee uno o más pares solitarios de electrones; en donde dicho agente tensoactivo es jabón. El polímero que tiene un grupo que comprende un sitio que posee uno o más pares solitarios de electrones potencia la eficacia antimicrobiana del metal oligodinámico. Reivindicación 1: Una composición
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