Systems, apparatus, and methods for monitoring electrosurgical systems are disclosed. In one variation, an electrosurgical monitoring apparatus includes at least two monitoring channels. Each of the monitoring channels in this embodiment are configured to monitor fault current between at least two separate conductive components of an electrosurgical system, and the at least two monitoring channels are each configured to send a control signal so as to control an application of power to an electrosurgical device responsive to the fault currents.
