プラズマを用いた流体浄化方法および流体浄化装置
- 专利权人:
- 清水;一男
- 发明人:
- 清水 一男
- 申请号：
- JP2008231474
- 公开号：
- JP4947807B2
- 申请日:
- 2008.09.09
- 申请国别(地区):
- JP
- 年份:
- 2012
- 代理人:
- 摘要：
PROBLEM TO BE SOLVED: To provide a fluid cleaning method and a fluid cleaning apparatus using plasma which can perform improved fluid cleaning without using a catalyst by generating a highly active low-temperature plasma by using a micrometer-order interelectrode gap so as to be operable in the vicinity of the Paschen minimum at normal atmospheric pressure.
SOLUTION: The plasma fluid cleaning method is a fluid cleaning method comprising arranging two metallic sheets 13 and 14 having a plurality of through-holes 11 and 12 in parallel with each other in a manner that the through-holes in one sheet coincide in position with the corresponding through-holes in the other sheet, generating a discharge by applying a voltage between the metallic sheets 13 and 14, and passing a fluid through the through-holes, wherein a porous dielectric film 16 is exposedly formed on at least either of the opposing surfaces of the metallic sheets.
COPYRIGHT: (C)2009,JPO&INPIT
- 来源网站：
- 中国工程科技知识中心
