A processing method for titanium metal implant surface includes: soaking a titanium metal implant in an electrolyte which temperature is 0~25℃ inputting 90~200 volt voltage to the electrolyte which soaking the titanium metal implant, and forming an oxidation layer on a surface of the titanium metal implant. Thus, to obtain a titanium metal implant which having a titanium metal layer and an oxidation layer, the oxidation layer is forming on the surface of the titanium metal layer, and hardness of the oxidation layer is 370~445Hv.一種鈦金屬植入物表面處理方法,係包含:一浸漬步驟,將一鈦金屬植入物浸漬於一電解液中,且控制該電解液之溫度為0~25℃;及一成膜步驟,於該浸漬有該鈦金屬植入物之電解液中,通入90~200伏特之電壓,以於該鈦金屬植入物表面生成一氧化層。於此係製成一鈦金屬植入物,其包含一鈦金屬層,以及形成於該鈦金屬層表面的一氧化層,且該氧化層之硬度係為370~445Hv。S1...浸漬步驟S2...成膜步驟