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Production method for high-purity organosilicon compound
专利权人:
发明人:
Seiki Tamura,Tatsuo Souda,Sayuri Sawayama,Seiji Hori
申请号:
US14655144
公开号:
US10066060B2
申请日:
2013.12.26
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present invention relates to a production method for a liquid high-purity organosilicon compound, the method comprising the steps of:adding, to a mixture containing an organosilicon compound selected from a group consisting of organomodified silcones and organomodified silanes and impurities, an organic wax having affinity with the impurities and having a higher melting point than the organosilicon compound, melting and mixing while heating, and introducing the impurities into the melted organic waxobtaining a solidified product of the organic wax by cooling the organic wax andperforming solid/liquid phase separation on the organosilicon compound and the solidified product of the organic wax.With the present invention, it is possible to provide a useful method for producing a high-purity organosilicon compound stably and on a commercial scale.
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