您的位置: 首页 > 农业专利 > 详情页

Porous silica particle and cleansing cosmetic
专利权人:
发明人:
Satoshi Watanabe,Naoyuki Enomoto,Yasutaka Miyoshi,Michio Komatsu
申请号:
US15520127
公开号:
US10143636B2
申请日:
2015.11.05
申请国别(地区):
US
年份:
2018
代理人:
摘要:
A porous silica particle optimized as the scrubbing agent is used for a cleansing cosmetic. The porous silica particle has an average circularity of 0.1 to 0.5, a pore volume of 1.0 to 2.0 ml/g, a mode diameter of 50 to 600 μm, and a ratio of the maximum particle diameter to the mode diameter of 3.0 or less. The porous silica particle moreover has a median size of 0.5 to 25 μm and the maximum particle diameter of 1 to 100 μm, after rubbing with a load of 1.0 to 1.4 KPa for 30 seconds. With the cleansing cosmetic containing this particle, the skin is rubbed by the frictional force generated by the friction with the skin at the rubbing. Therefore, the mild peeling effect for the stratum corneum is obtained and the damage of the skin and the micro damage on the stratum corneum can be prevented.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充