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Facial mask headgear including asymmetrically arranged strap loops
专利权人:
RESMED LIMITED
发明人:
THOMAS, JONATHAN HUW,BRAMBILLA, ENRICO,FLOWER, RENEE FRANCES (NEE DOHERTY),GUNNING, PHILIP JOHN,KOOIJ, MICHIEL,KWOK, PHILIP RODNEY
申请号:
NZ59186308
公开号:
NZ591863A
申请日:
2008.06.17
申请国别(地区):
NZ
年份:
2013
代理人:
摘要:
A respiratory mask, comprising: a mask frame a forehead support provided to the mask frame, the forehead support including a forehead member and headgear including first and second straps extending from lateral sides of the forehead member. The forehead member includes at least one hole configured and positioned to allow the first and second straps to form first and second strap loops that loop around respective portions of the forehead member. The first and second strap loops are asymmetrically arranged with respect to a vertical plane of symmetry of the forehead member.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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