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線掃描裝置
专利权人:
发明人:
INOUE, JUNICHI,井上淳一,井上淳一
申请号:
TW099140796
公开号:
TWI459406B
申请日:
2010.11.25
申请国别(地区):
TW
年份:
2014
代理人:
摘要:
The invention includes a beam irradiation means (2) which radiates a line scanning beam (L), an irradiation position sensor (11) which detects an irradiation position of the line scanning beam, an arithmetic processing circuit unit (13) which measures the stationary time of the line scanning beam at the irradiation position detected by the irradiation position sensor, and an irradiation control unit which performs scanning control of the line scanning beam by utilizing the irradiation position measured by the irradiation position sensor and the stationary time detected by the arithmetic processing circuit unit. According to this line scanning apparatus, scanning control of the line scanning beam is performed by utilizing the irradiation position of the beam and the stationary time corresponding to the irradiation position, so that irradiation of the beam to an erroneous position or excessive irradiation of the line scanning beam can be more reliably prevented, and thereby the reliability of the line scanning apparatus can be improved.本發明之課題:係以提供可以謀求提高可靠性之線掃描裝置為目的。本發明具備:照射噴嘴(2),係照射線掃描射束;照射位置傳感器(11),係檢測線掃描射束之照射位置;運算處理電路部(13),係測定在照射位置傳感器(11)所檢測出的照射位置處之線掃描射束的停留時間;照射控制部(14),係利用照射位置傳感器(11)所檢測出的照射位置和運算處理電路部(13)所測定出的停留時間,對線掃描射束進行掃描控制。根據這種線掃描裝置(1),係利用線掃描射束之照射位置及與該照射位置對應之停留時間,對線掃描射束進行掃描控制,藉此可以更確實地防止射束向錯誤位置之照射或過量照射,從而可以謀求提高線掃描裝置的可靠性。
来源网站:
中国工程科技知识中心
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