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AMÉLIORATION DE SÉCURITÉ POUR DES APPLICATIONS UV PAR SURVEILLANCE DES CHANGEMENTS DE DÉCOUPLAGE D'UV
专利权人:
Koninklijke Philips N.V.
发明人:
申请号:
EP17172508.8
公开号:
EP3406269A1
申请日:
2017.05.23
申请国别(地区):
EP
年份:
2018
代理人:
摘要:
The invention provides an system (200) comprising (i) a light source (220) configured to provide radiation (221), wherein the radiation (221) at least comprises UV radiation; (ii) a waveguide element (1210) comprising a radiation exit window (230), wherein the waveguide element (1210) is configured to receive at least part of the radiation (221) and to radiate at least part of the radiation (221) to the exterior of the waveguide element (1210) via the radiation exit window (230) and configured to internally reflect part of the radiation (221) at the radiation exit window (230); (iii) an optical sensor (310) configured to sense an internal reflection intensity (I) of the internally reflected radiation (221); and (iv) a control system (300), functionally coupled to the optical sensor, and configured to reduce the intensity of the radiation (221) as function of reaching a predetermined first threshold of a reduction of the internal reflection intensity (I) over a time.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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