The annular carboxylic acid of poor solubility is included, to be concentrated, at the same time, the solution for cleaning disinfection of haploid. The particular solution approximately to have the pH of 0.05 - approximately 2, at the same time, the hydrogen peroxide of approximately 2%w/w - approximately 8%w/w Approximately 5%w/w - The direct alkyl benzenesulfonic acid of approximately 20%w/w Approximately 0.5%w/w - At least one poor solubility of approximately 8%w/w (namely, solubility at room temperature in pure water is under 1%w/w) annular carboxylic acid (as for particular annular carboxylic acid, with Acid configuration and salt configuration, at least the 9:1 (the Acid: The salt) it exists at ratio) Approximately 2%w/w - Approximately, for example at least one block copolymer surface active agent of 10%w/w (, PLURONIC L62) And approximately 4%w/w - approximately 15%w/w it includes one composition at least, consists of these basically, or consists of these.< Choice figure >It is not難溶性の環状カルボン酸を含む、濃縮され、かつ、単相の洗浄消毒用溶液。当該溶液は、約0.05~約2のpHを有し、かつ、約2%w/w~約8%w/wの過酸化水素;約5%w/w~約20%w/wの直鎖アルキルベンゼンスルホン酸;約0.5%w/w~約8%w/wの少なくとも1つの難溶性の(すなわち、純水中の、室温での溶解度が1%w/w未満である)環状カルボン酸(当該環状カルボン酸は、酸形態および塩形態で、少なくとも9:1(酸:塩)の比で存在する);約2%w/w~約10%w/wの少なくとも1つのブロックコポリマー界面活性剤(例えば、PLURONIC L62);および約4%w/w~約15%w/wの少なくとも1つの溶剤を含み、基本的にこれらからなり、またはこれらからなる。【選択図】なし
